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Depth-profiling of vertical material contrast after VUV exposure for contact-free polishing of 3D polymer micro-optics

机译:VUV暴露后垂直材料的深度剖面对比3D聚合物微光学的无接触抛光

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We characterize the impact of high-energy, 172 ran vacuum ultraviolet photons on the molecular weight and the glass transition temperature of poly(methyl methacrylate). We found that the molecular weight is reduced strongly on the surface of the exposed samples with a continuous transition towards the unexposed bulk material being located below the modified region. The glass transition temperature was found to be significantly lowered in the exposed region to well below 50°C compared to that of the 122°C of the bulk region. We could use this material contrast to selectively reflow the top surface of the exposed samples only. This allowed us to create ultra-smooth micro-optical structures by postprocessing without influencing the overall geometry that is required for the optical functionality.
机译:我们表征了高能,172 ran真空紫外光子对聚(甲基丙烯酸甲酯)的玻璃化转变温度的影响。我们发现分子量在暴露的样品的表面上强烈减小,其具有朝向未曝光的散装材料位于修饰区域下方的未曝光。发现玻璃化转变温度在暴露的区域中显着降低到低于50℃的散装区域的区域。我们可以使用这种材料对比,以选择性地回流暴露样本的顶表面。这使我们可以通过后处理创建超光滑的微光学结构,而不会影响光学功能所需的整体几何体。

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