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Depth-profiling of vertical material contrast after VUV exposure for contact-free polishing of 3D polymer micro-optics

机译:VUV曝光后垂直材料对比度的深度剖析,用于3D聚合物微光学器件的无接触抛光

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We characterize the impact of high-energy, 172 ran vacuum ultraviolet photons on the molecular weight and the glass transition temperature of poly(methyl methacrylate). We found that the molecular weight is reduced strongly on the surface of the exposed samples with a continuous transition towards the unexposed bulk material being located below the modified region. The glass transition temperature was found to be significantly lowered in the exposed region to well below 50°C compared to that of the 122°C of the bulk region. We could use this material contrast to selectively reflow the top surface of the exposed samples only. This allowed us to create ultra-smooth micro-optical structures by postprocessing without influencing the overall geometry that is required for the optical functionality.
机译:我们表征了高能172nm真空紫外光子对聚甲基丙烯酸甲酯的分子量和玻璃化转变温度的影响。我们发现,暴露的样品表面上的分子量大大降低,并且朝着位于修饰区域下方的未暴露的散装材料连续过渡。与本体区域的122℃相比,发现暴露区域的玻璃化转变温度显着降低至远低于50℃。我们可以使用这种材料对比来仅选择性地回流暴露样品的顶表面。这使我们能够通过后处理创建超光滑的微光学结构,而不会影响光学功能所需的整体几何形状。

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