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Monte Carlo simulation of the breakdown in copper vapour at low pressure

机译:低压下铜蒸气分解的蒙特卡洛模拟

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The breakdown conditions of copper vapour at low pressure are studied in a Monte Carlo simulation of electrons, copper ions and fast copper atoms. This is of interest for the dielectric breakdown strength of a vacuum interrupter after current zero, where hot vapour is still emitted from the electrodes. A one-dimensional model with given voltage drops in the kV range is applied to study the charge carrier multiplication in the gap. Initiated by the thermionic emission the electron impact ionization of copper atoms produces singly as well as twofold charged ions and causes electron avalanches. The simulation allows studying detailed energy distributions of electrons, ions and fast atoms across the gap. By scanning a large range of gas densities and electric voltages, the boundary of the breakdown region has been determined.
机译:在电子,铜离子和快速铜原子的蒙特卡洛模拟中研究了低压下铜蒸气的击穿条件。这对于零电流后真空灭弧室的绝缘击穿强度很重要,此时仍从电极散发出热蒸汽。使用给定电压降在kV范围内的一维模型来研究间隙中的电荷载流子倍增。由热电子发射引发,铜原子的电子碰撞电离产生单电荷离子和两倍电荷离子,并引起电子雪崩。通过模拟,可以研究间隙中电子,离子和快速原子的详细能量分布。通过扫描大范围的气体密度和电压,已经确定了击穿区域的边界。

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