首页> 外文会议>18th IEEE International Symposium on the Applications of Ferroelectrics (ISAF 2009) >Enhanced Dielectric Properties of Ca(Mg1/3Nb2/3)O3 / CaTiO3 Multilayer Heterogeneous Thin Films
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Enhanced Dielectric Properties of Ca(Mg1/3Nb2/3)O3 / CaTiO3 Multilayer Heterogeneous Thin Films

机译:Ca(Mg1 / 3Nb2 / 3)O3 / CaTiO3多层非均质薄膜的介电性能增强

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CCa(Mg1/3Nb2/3)O3/CaTiO3 (CMN/CT)heterostructure dielectric thin films, with the same thickness but different arrangement patterns, were prepared by Pechini method. The effects of the heterogeneous interface on the structure and properties have been studied. The results showed that, in nonalternating arrangement films, single perovskite phase can only be obtained in TM heterostructure film, in which CaTiO3 layer has grown on the substrate firstly, and the dielectric properties of this film is εr=47.5, tanδ=0.020 at 1MHz. Comparing with non-alternating arrangement film, all alternating arrangement films have single perovskite phase, and the existing of heterogeneous interface enhanced the dielectric properties of TMM and MMT alternating arrangement films by introducing space charges. And the dismatch between CMN and CT layers can avoid the harmful particle forming, improve crystallization and surface morphology, and keep the dielectric loss at a low level. At 1MHz, the dielectric constant (εr) of TMM and MMT films are 66.3 and 63.6, while both dielectric loss (tanδ) are 0.021.
机译:采用Pechini方法制备了厚度相同,排列方式不同的CCa(Mg1 / 3Nb2 / 3)O3 / CaTiO3(CMN / CT)异质结构电介质薄膜。研究了异质界面对结构和性能的影响。结果表明,在非交替排列的薄膜中,钙钛矿相只能在TM异质结构薄膜中获得,其中钙钛矿层首先在衬底上生长,并且该薄膜的介电性能为εr= 47.5,tanδ= 0.020在1MHz 。与非交替布置膜相比,所有交替布置膜都具有单个钙钛矿相,并且异质界面的存在通过引入空间电荷而增强了TMM和MMT交替布置膜的介电性能。 CMN和CT层之间的不匹配可以避免有害颗粒的形成,改善结晶和表面形态,并使介电损耗保持在较低水平。在1MHz时,TMM和MMT膜的介电常数(εr)分别为66.3和63.6,而介电损耗(tanδ)均为0.021。

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