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Synthesis and Properties of Mn-Doped (Bi_(0.5)Na_(0.5))TiO_3 Thin Films by Chemical Solution Deposition

机译:通过化学溶液沉积的Mn掺杂(Bi_(0.5)Na_(0.5))TiO_3薄膜的合成与性能

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Lead-free ferroelectric (Bi_(0.5)Na_(0.5))TiO_3 (BNT) thin films were prepared by chemical solution deposition. BNT and Mn-doped BNT precursor thin films crystallized in the perovskite single phase at 700 °C on Pt/TiO_x/SiO_2/Si substrates. The leakage current density of the perovskite BNT films, especially in the high applied field region, was reduced by doping with a small amount of Mn. Also, Mn doping markedly improved the ferroelectric properties of the films. 0.5 and 1.0 mol% Mn-doped BNT thin films exhibited well-shaped ferroelectric polarization (P)-electric field (E) hysteresis loops at room temperature. Furthermore, the 1 mol% Mn-doped BNT films showed a typical field-induced strain loop, and the effective d_(33) values were estimated to be about 60 pm/V.
机译:通过化学溶液沉积制备无铅铁电(Bi_(0.5)Na_(0.5))TiO_3(BNT)薄膜。 BNT和MN掺杂的BNT前体薄膜在Pt / TiO_x / SiO_2 / Si衬底上在700℃下在钙钛矿单相中结晶。 通过用少量Mn掺杂,通过掺杂减少钙钛矿BNT薄膜的泄漏电流密度,特别是在高施加的场区域中。 而且,Mn掺杂显着改善了薄膜的铁电性质。 0.5和1.0mol%Mn掺杂的BNT薄膜在室温下表现出孔形的铁电偏振(P)磁磁场(E)滞后环。 此外,1摩尔%MN掺杂的BNT膜显示出典型的场诱导的应变环,估计有效的D_(33)值为约60μm/ v。

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