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Inspection of through silicon vias (TSV) and other interconnections in IC packages by computed tomography

机译:通过计算机断层扫描检查硅通孔(TSV)和IC封装中的其他互连

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Through silicon vias (TSV) as used in 3D integrated electronic packages were inspected non-destructively by highly resolving nanofocus computed tomography (nanoCT). In particular, in the TSVs plating voids were visualised and quantitatively evaluated by numerical processing of the resulting volumetric data. The nanoCT technology is outlined and further applications such as interposers etc. are considered.
机译:通过高度解析的纳米焦点计算机断层扫描(nanoCT),对3D集成电子封装中使用的硅通孔(TSV)进行了无损检查。尤其是,在TSV中,通过对所得体积数据进行数值处理,可以观察到镀层中的空隙并对其进行定量评估。概述了nanoCT技术,并考虑了诸如中介层等其他应用。

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