Preparation and Properties of TiO_2 Photocatalyst Film Deposited by DC Reactive Magnetron Sputtering

摘要

TiO_2 films were deposited on glass substrate by DC reactive magnetron sputtering method. The film deposited for five hours had anatase phase with a preferred orientation along the (220) direction, but the films deposited for two and three hours were amorphous. The crystallite sizes of the films were 17.7, 15.3 and 13.5 nm for the films deposited at argon flow rates of 5.66,9.91 and 14.15 ml/min, respectively. The XPS spectra of the Ti2p and Ols regions showed that titanium in the TiO_2 films was Ti~(4+) and oxygen was composed of O~(2-) in TiO_2 and H_2O. When the annealing temperature was below 700 °C, only anatase grew in the TiO_2 films. TiO_2 phase changed from anatase to rutile when the annealing temperature was above 800 °C. The photocatalytic activity decreased with increasing annealing temperature.