首页> 外文会议>Proceedings of the 36th European Solid-State Device Research Conference (ESSDERC 2006) >Threshold voltage dispersion and impurity scattering limited mobility in carbon nanotube field effect transistors with randomly doped reservoirs
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Threshold voltage dispersion and impurity scattering limited mobility in carbon nanotube field effect transistors with randomly doped reservoirs

机译:具有随机掺杂储层的碳纳米管场效应晶体管中的阈值电压分散和杂质散射限制了迁移率

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We have investigated the threshold voltage dispersion and the impurity scattering limited mobility in carbon nanotube field effect transistors with randomly doped source and drain extensions. Accurate transport simulations have been performed solving the self-consistent 3D Poisson-Schrodinger equation, within the non-equilibrium Green's function formalism. In particular, non-ballistic transport has been taken into account, due to elastic scattering with ionized impurities in doped source and drain extensions. We show that even if the channel is un-doped, impurity scattering in the source and drain extensions can significantly reduce the effective mobility, intrinsically inhibiting ballistic transport, while the effect of random dopants on the dispersion of the threshold voltage is limited.
机译:我们已经研究了具有随机掺杂的源极和漏极扩展的碳纳米管场效应晶体管的阈值电压色散和杂质散射限制的迁移率。在非平衡格林函数形式主义内,已经解决了自洽的3D Poisson-Schrodinger方程,进行了精确的运输模拟。特别地,由于在掺杂的源极和漏极延伸部分中被电离杂质的弹性散射,已经考虑了非弹道传输。我们表明,即使沟道是未掺杂的,在源极和漏极扩展中的杂质散射也会显着降低有效迁移率,本质上抑制了弹道传输,而随机掺杂剂对阈值电压的色散的影响受到限制。

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