首页> 外文会议>European photovoltaic solar energy conference >IMPROVED QUANTUM EFFICIENCY IN GASB/GAAS HETEROJUNCTION PHOTOVOLTAIC CELLS USINGAN OFFSET P-N JUNCTION
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IMPROVED QUANTUM EFFICIENCY IN GASB/GAAS HETEROJUNCTION PHOTOVOLTAIC CELLS USINGAN OFFSET P-N JUNCTION

机译:使用偏移P-N结改进了GASB / GAAS异质结光伏电池中量子效率

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The external quantum efficiency of GaSb/GaAs heterojunction TPV cells has been enhanced by using a thinn-GaSb buffer layer between the n-GaAs and the p-GaSb to offset the p-n junction from the heterojunction. All samples weregrown by MOVPE at temperatures of 590°C. Cells with the p-n junction displaced from the heterojunction showed asignificant improvement in photoresponse and open circuit voltage (VOC). Short circuit current (ISC) was also increased byaddition of a thin n-GaSb layer (~100nm) but little or no improvement resulted if the n-GaSb layer thickness was furtherincreased. For the growth conditions and doping levels in this set of samples a displacement of the p-n junction from theheterojunction of around 400nm was sufficient to achieve maximum enhancement in performance.
机译:GaSb / GaAs异质结TPV电池的外部量子效率已通过使用薄 n-GaAs和p-GaSb之间的n-GaSb缓冲层可从异质结偏移p-n结。所有样品均为 由MOVPE在590°C的温度下生长。 p-n结从异质结移开的细胞显示出 光响应和开路电压(VOC)的显着改善。短路电流(ISC)也增加了 添加了一层薄的n-GaSb层(约100nm),但如果n-GaSb层的厚度进一步增加,则几乎没有改善或没有改善 增加。对于这组样品中的生长条件和掺杂水平,p-n结相对于p-n结的位移。 大约400nm的异质结足以实现性能的最大增强。

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