Dynamic Pot-Life and Handling Evaluation of EPL2362 First Step Copper Slurry

摘要

Rodel EPL2362, a single-component, first-step copper chemical-mechanical planarization (CMP) slurry utilizing a colloidal silica abrasive was subjected to a dynamic pot-life and extensive handling evaluation. The main objective of this study was to determine the effects of a BOC Edwards iSIS 2000 vacuum-pressure dispense slurry delivery system on the long-term stability of EPL2362 in a bulk slurry delivery environment. The slurry was hand blended by mixing 9 parts EPL2362 to 1 part 30% wt. H_2O_2 oxidizer, by weight. The slurry blend was subjected to 192 hours of recirculation in a simulated slurry global distribution loop (220 ft of (3/4)-inch PFA tubing). Samples were collected at different time points to measure typical slurry health parameters and to obtain filtration, wafer polishing rate, and defectivity data. Bench top measurements were conducted to determine the sensitivity of measurement parameters to variations in the mix ratio. De-ionized water dilution tests were made to identify the sensitive measurement parameters to detect a fab DI water leak. Slurry was tested to determine the mixing time for the incoming abrasive component and also observed for the settling behavior over an extended period of time. This study demonstrates the ability of a vacuum-pressure-dispense slurry delivery system in maintaining EPL2362 slurry health during extensive handling.