首页> 外文会议>Chemical-Mechanical Planarization for ULSI Multilevel Interconnection Conference (CMP-MIC) >A HISTORY OF NICKEL-IRON (NiFe) CMP AS USED IN THE MAGNETIC HEADS INDUSTRY
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A HISTORY OF NICKEL-IRON (NiFe) CMP AS USED IN THE MAGNETIC HEADS INDUSTRY

机译:磁头行业中镍铁(NiFe)CMP的历史

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摘要

NiFe CMP, a process unique to the magnetic heads industry, was first introduced five years ago. In this paper, the progress of NiFe CMP is discussed, from the post-CMP process characteristics prior to the introduction of slurries designed to polish nickel-iron compounds to the current methods of simultaneously polishing nickel-iron compounds and other metals on the same surface. Defects and drawbacks inherent to NiFe CMP are also discussed.
机译:NiFe CMP是磁头行业独有的一种工艺,该工艺于5年前首次推出。本文讨论了NiFe CMP的进展,从引入CMP抛光镍铁化合物浆料之前的CMP后工艺特性,到在同一表面上同时抛光镍铁化合物和其他金属的当前方法。 。还讨论了NiFe CMP固有的缺陷和缺点。

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