Development of 193nm Organic BARC

摘要

Bottom Anti-Reflective Coatings (BARC) for ArF Lithography Technology were developed using a polymeric system, which was thermally stable to sustain high temperatures encountered in bake process. On Lithographic performance, the shape of photoresist pattern on new BARC was controllable by the additives in BARC composition. For example, NCA429 was compatible with PAR7 10 (sumitomo ArF photoresist) New ArF BARC also have better properties suitable for current process than existing ArF BARC. : Firstly, the etch rate was about 1.3-1.5 times higher than that of PAR7 10. New BARC was able to be etched faster than existing BARC . Secondly, spin bowl crosslinking issue of BARC in spin cup and drain was solved to wash by photoresist solvent, because it was hard to crosslink without baking.