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A new evalaution method of adhesion between glass/epoxy composite substrate and copper foil for multilayer ircuit board applications

机译:多层电路板应用中玻璃/环氧树脂复合基板与铜箔之间附着力的评估新方法

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There have been several researches for characterization of the adhesion problems from the viewpoint of fracture mechanic,s such as underfill adhesion performance of area-array packages and rehabilitation of infrastructure with the use of FRP sheets (1-2). Adhesion stability of multilayer circuit boards has come an important issue in the electronic package industry. A typical multilayer construction consists of several layers of woven glass/epoxy composite substrate and copper foil. Pos-manufacturing processes with thermal shock such as solder masking, solder reflow and wave soldering cause several types of damage, which significantly affect on the performance of the package. One is macroscopic delamination at interfaces between the composite substrate and the coppr foil or at interlayer in the substrate. Another oen is microscopic fracture in the substrates such as measling and crazing (3-4). It is necessary for a new test method to enable to evalaute the macroscopic and microscopic damages at the same time. Conventional peeling test is suitable to measure the adhesion strength. However, is is impossible that the macroscopic and microscopic damages and/or the adhesion at substrate/copper interface in core-layer are estiamted. In this study, we propose Mode I interlaminar fracture toughness test as a new technique that is able to quantitatively measure the interfacial fracture energies of multilayer circuit board systems usign a fracture-mechanics approach. In order to relate a geometry of the copper foils to the fracture energies, effect of the copper foil style was characterized at first.
机译:从断裂力学的角度,已经进行了一些表征粘合问题的研究,例如面阵包装的底部填充粘合性能和使用FRP片材修复基础设施(1-2)。多层电路板的粘合稳定性已经成为电子封装工业中的重要问题。典型的多层结构由几层玻璃/环氧树脂复合基材和铜箔组成。带有热冲击的正向制造工艺(例如阻焊剂,回流焊和波峰焊)会导致多种类型的损坏,从而严重影响封装的性能。一种是在复合基材和铜箔之间的界面处或基材的中间层处的宏观分层。另一个原因是基底上的微观断裂,例如麻疹和裂纹(3-4)。对于一种新的测试方法,必须能够同时评估宏观和微观损伤。常规的剥离试验适合于测量粘合强度。然而,不可能估计宏观和微观损伤和/或在核心层中的基材/铜界面处的粘附性。在这项研究中,我们提出了模式I层间断裂韧性测试作为一种新技术,该技术能够定量采用断裂力学方法来测量多层电路板系统的界面断裂能。为了使铜箔的几何形状与断裂能相关联,首先表征了铜箔样式的效果。

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