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Ultra hard TiBN coatings obtained by new plasma enhanced reactive sputter deposition

机译:通过新的等离子增强反应溅射沉积获得的超硬TiBN涂层

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The mechanical and growth properties of TiBN coatings were studied versus bias parameters. Thses coatings were obtained using a new plasma enhanced reactive sputter depositoin process. The explored zone expands for bias voltage from-5 to -125 V and for ion flow to atom flow ratio from 0.35 to 1.39.
机译:研究了TiBN涂层的机械性能和生长性能与偏置参数的关系。这些涂层是使用新的等离子体增强反应溅射沉积法获得的。探索的区域扩大,偏置电压从5到-125 V,离子流与原子的流量比从0.35到1.39。

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