首页> 外文会议>Symposium on optical materials for high-power lasers >Characterization of surface and subsurface defects in optical materials using near-field evanescent wave (Abstract Only)
【24h】

Characterization of surface and subsurface defects in optical materials using near-field evanescent wave (Abstract Only)

机译:使用近场e逝波表征光学材料中的表面和亚表面缺陷(仅摘要)

获取原文

摘要

Abstract: Optical properties of sub-micron defects is of interest in many application, including laser induced damage in optical materials. In-situ scanning atomic force microscopy has been used previously to establish a direct correlation between a particular structure surface inhomogeneity and the initiation of local laser damage at that inhomogeneity, as in the case of nodular defects in coatings. Recent development in near field scanning optical microscopy shows that this technique can also provide information on both morphology and optical properties of localized defects. !0
机译:摘要:亚微米缺陷的光学特性在许多应用中都受到关注,包括光学材料中的激光诱导损伤。先前已经使用原位扫描原子力显微镜来建立特定结构表面不均匀性与在该不均匀性上的局部激光损伤的引发之间的直接关联,例如在涂层中出现结节状缺陷的情况下。近场扫描光学显微镜的最新发展表明,该技术还可以提供有关局部缺陷的形态和光学特性的信息。 !0

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号