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Investigation of electric field induced surface phenomena by soft x-ray laser interferometry

机译:用软X射线激光干涉法研究电场引起的表面现象

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The first observation of niobium surface evolution under applied electric field has been achieved by means of a x-ray laser interferometry. Single shots of 80 ps pulse X-ray laser duration allowed record of interferograms leading to quasi instantaneously probe the surface morphology. Delay between shots was 20 mn while applied voltage between the Nb sample and a stainless steel blade-like anode has been kept constant. Comparison of successive interferograms shows Nb surface evolution over several hours. Prior any measurable current apparition a defect has grown up for electric field of 25 MV/m. At 35 MV/m a micro-breakdown appeared leading to a strong modification of the surface morphology. Keeping this field during 20 mn has generated the evolution of the defect produced by the micro-breakdown. These results open a new way to a better understanding of surface emission field effect and electric breakdown precursors.
机译:借助X射线激光干涉仪已实现了在施加电场下铌表面演变的首次观察。 80 ps脉冲X射线激光持续时间的单次拍摄允许记录干涉图,从而准时探测表面形态。两次发射之间的延迟为20百万,同时Nb样品和不锈钢叶片状阳极之间的施加电压保持恒定。连续干涉图的比较显示了几个小时后Nb表面的演变。在任何可测量的电流作用之前,对于25 MV / m的电场,缺陷已经长大。在35 MV / m时,出现了细微的击穿,从而导致了表面形态的强烈改变。将磁场保持在20百万以内引起了由微观击穿产生的缺陷的演变。这些结果为更好地了解表面发射场效应和电击穿前驱物开辟了一条新途径。

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