首页> 外文会议>International conference on silicon carbide, III-nitrides and related materials;ICSCIII-N'97 >Photoluminescence and Raman Scattering Characterization of GaN, InGaN and AlGaN Films Using a UV Excitation Raman-Photoluminescence Microscope
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Photoluminescence and Raman Scattering Characterization of GaN, InGaN and AlGaN Films Using a UV Excitation Raman-Photoluminescence Microscope

机译:使用紫外激发拉曼-光致发光显微镜对GaN,InGaN和AlGaN薄膜进行光致发光和拉曼散射表征

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A combined room temperature photoluminescence (PL) and Raman scattering study was performed on a series of GaN, InGaN and AlGaN epitaxial films grown on sapphire by low pressure metalorganic chemical vapor deposition, using a UV Raman-PL microscope. Each PL or Raman spectrum was taken within a few seconds or minutes, with fine and weak features obtained superior than using other spectrometers. Accurate information about the band gap energy, alloy composition, material properties and structures, in particulr for low composition ternaries, was obtained. The rapid feedback of the material properties with the growth process was realized. The combined PL and Raman features, their variations with excitation power, energy, and resonance are studied with respect to the material characteristics, structures and parameters.
机译:使用紫外拉曼-PL显微镜,对通过低压金属有机化学气相沉积在蓝宝石上生长的一系列GaN,InGaN和AlGaN外延膜进行了室温光致发光(PL)和拉曼散射的组合研究。每个PL或拉曼光谱都是在几秒钟或几分钟内拍摄的,其精细和较弱的特征优于其他光谱仪。获得了有关带隙能,合金成分,材料性能和结构的准确信息,特别是对于低成分三元态而言。实现了材料特性随生长过程的快速反馈。从材料特性,结构和参数方面研究了PL和Raman组合特征,其随激发功率,能量和共振的变化。

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