An Al-1.08 vol.%Si alloy was cold rolled to a reduction of 98% (ε_(VM) = 4.5) and then annealed at different temperatures up to 210°C (0.52 Tm) for different times. The deformed structure is characterized by a nanoscale lamellar structure with the presence of Si particles of coarse (> 1μm), medium (100 nm - 1 μm) and fine (< 100 nm) sizes in the microstructure. Deformation zones are formed around the coarse Si particles and the boundary spacing is finer in the deformation zone than in the matrix. The medium Si particles have little effect on the morphology and boundary spacing. The fine Si particles are aligned along the lamellar boundaries indicating a stabilizing effect on the structural refinement during cold rolling. After annealing, enhanced recovery occurs in the deformation zones around the coarse Si particles. However the reduction in stored energy during recovery and the pinning effect of fine Si particles on the boundary migration prevent the advantage of particle stimulated nucleation (PSN) of coarse Si particles in the nanoscale lamellar structure. This study also demonstrates an important effect of the fine particles in delaying both recovery and recrystallization processes. This effect diminishes with increasing annealing temperature and coarsening the fine particles especially at triple junctions.
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