Simulation study of multiple acceptable models existing in the interpretaton of ellipsometric data

摘要

Ellipsometry has been widely used in the measurements of thin film thickness and optical properties. The existence of multiple acceptable models has been confirmed in the interpretation of the measured ellipsometric data, which can degrade the measurement accuracy. How to eliminate this ambiguity is very importnat. In the present paper, we apply a simulation method to study the existence of multiple acceptable models and to seek the methods to alleviate such kinds of ambiguity. in the simulation study, a simple structure model (silicon dioxide fim coated on silicon substrate) is used.