首页> 外文会议>Symposium on ferroelectric thin films >STUDIES OF DIELECTRIC PROPERTIES OF PULSED LASER DEPOSITED (Ba, Sr)TiO_3 FILMS USING LaNiO_3 AS CONDUCTIVE ELECTRODE
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STUDIES OF DIELECTRIC PROPERTIES OF PULSED LASER DEPOSITED (Ba, Sr)TiO_3 FILMS USING LaNiO_3 AS CONDUCTIVE ELECTRODE

机译:使用Lanio_3作为导电电极的脉冲激光沉积(BA,SR)TiO_3膜的介电性能研究

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摘要

LaNiO_3 (LNO) films were used as conductive bottom and top electrodes for the fabrication of (Ba_(0.5)Sr_(0.5)) TiO_3 (BST) capacitors on silicon substrates. LNO as well as BST films were grown in-situ using a pulsed laser deposition technique with no subsequent heating or oxygenation treatments. Capacitance and leakage current measurements of BST films were carried out using LNO/BST/LNO/Si structures. Using these measurements, the dielectric constant and leakage current of BST films were found to be ~250 and ~10~(-8) A/cm~2, respectively. The results obtained in the present study suggest that LNO is a good contact electrode material for BST films in the fabrication of BST capacitors with good structural and electrical properties.
机译:Lanio_3(LNO)薄膜用作用于制造(Ba_(0.5)SR_(0.5))TiO_3(BST)电容器上的导电底部和顶电极在硅基板上的电容器。使用脉冲激光沉积技术在原位生长的LNO以及BST薄膜,没有随后的加热或氧合处理。使用LNO / BST / LNO / Si结构进行BST薄膜的电容和漏电流测量。使用这些测量,发现BST薄膜的介电常数和漏电流分别为约250〜10〜(-8)A / cm〜2。在本研究中获得的结果表明,LNO是用于BST薄膜的良好接触电极材料,用于制造BST电容器,具有良好的结构和电性能。

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