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Method of Depositing Films with Narrow-Band Conductive Properties
Method of Depositing Films with Narrow-Band Conductive Properties
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机译:沉积具有窄带导电特性的薄膜的方法
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摘要
Conducting materials having narrow impurity conduction bands can reduce the number of high energy excitations, and can be prepared by a sequence of plasma treatments. For example, a dielectric layer can be exposed to a first plasma ambient to form vacancy sites, and the vacancy-formed dielectric layer can be subsequently exposed to a second plasma ambient to fill the vacancy sites with substitutional impurities.
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