Accelerated electrons applacation for chemical reactions stimulation

摘要

Different electron beam applications in electronics, chemistry and environmental control are presented. Particular attention is paid to the physical description and the mathematical model for the novel type of plasma chemical reactor for the processing of tin films based on the heating of plasma electrons with the power of the electron beam. A electron beam plasma discharge at room temperature operates in a wide range of parameters and reactor geometry including planar geometry. The gas pressure can be varied in the range 10~(-4) -30 Torr. Plasam densities achieve the values of 10~(11)-10~(12) cm~(-3) and degree of ionization # alpha# approx approx 10~(-2) in the optimal operating conditions (the range of #alpha# variations is 10~(-4)).