RF Plasma Fabrication of Nano-Scaled Ceramic Oxides for Energy Devices

摘要

There exist several fabrication techniques to produce nano-scaled materials for energy applications, such as chemical vapor deposition and sputtering techniques (Wan et al., 1989, and Shigesato et al., 1992). However, these existing techniques all require vacuum systems, which limit the size and deposition rate of the thin films for energy devices. In the past several years, we have developed an RF plasma fabrication technique which has potential for large scale production (Wang et al., 1990). Various oxide materials have been produced by this novel technique, such as Yttrium Stabilized Zirconia (YSZ) and Indium-Tin Oxide. In the case of YSZ, nanoscaled thin films have been made to form the electrolyte layer of a solid oxide fuel cell. In the case of smart window materials, transparent, conductive Indium-Tin Oxide coatings on Soda-Lime-Silicate float glass have been produced. These films have a thickness of approximately 0.3 μm and an average crystallite size of 25 nm. They can be used for application in electrochromic windows in home, office, car or aircraft windows to reflect longwave, IR heat rays while transmitting light.