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An O(nlogm) algorithm for VLSI design rule checking

机译:用于VLSI设计规则检查的O(nlogm)算法

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摘要

This paper describes a new variant of the segment tree approach for VLSI design rule checking. The best known algorithms to date for flat VLSI design rule checking require O(nlogn) expected time and O(√n) expected space, where n is the total number of edges on a mask layer of the chip. We present a new algorithm that can run in O(nlogm) expected time, where m is the maximum feature size on a particular mask layer. Since the maximum feature size must be bounded by the height of a chip, i.e. m ≤ O(√n), the new algorithm is adaptively more efficient than O(nlogn). For layers such as diffusion or contact windows where the maximum feature size is independent of chip size, i.e. m = O(1), the new algorithm runs in O(n) expected time, a definite improvement. The improved time efficiency is achieved without sacrificing O(√n) expected space complexity.

机译:

本文介绍了用于VLSI设计规则检查的分段树方法的新变体。迄今为止,用于平面VLSI设计规则检查的最著名算法需要O( n log n )预期时间和O(√ n )预期空间,其中 n 是芯片的掩模层上的边缘总数。我们提出了一种新算法,该算法可以在O( n log m )的预期时间内运行,其中 m 是特定蒙版上的最大特征尺寸层。由于最大特征尺寸必须由芯片的高度限制,即 m ≤O(√ n ),因此新算法是自适应比O( n log n )更有效。对于最大特征尺寸与芯片尺寸无关(例如 m = O(1))的诸如扩散或接触窗口之类的层,新算法在O( n )中运行预期的时间,有一定的改善。在不牺牲O(√ n )预期空间复杂度的情况下,可以提高时间效率。

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