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Energetic laser cleaning of metallic particles and surface damage on silica optics: Investigation of the underlying mechanisms

机译:精力充沛的激光清洁金属颗粒和硅胶表面的表面损伤:对潜在机制的研究

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Surface paniculate contamination on optics can lead to laser-induced damage hence limit the performance of high power laser system. In this work we focus on understanding the fundamental mechanisms that lead to damage initiation by metal contaminants. Using time resolved microscopy and plasma spectroscopy, we studied the dynamic process of ejecting ~30 μm stainless steel particles from the exit surface of fused silica substrate irradiated with 1064 nm, 10 ns and 355 ran, 8 ns laser pulses. Time-resolved plasma emission spectroscopy was used to characterize the energy coupling and temperature rise associated with single, 10-ns pulsed laser ablation of metallic particles bound to transparent substrates. Plasma associated with Fe(Ⅰ) emission lines originating from steel microspheres was observe to cool from >24,000 K to ~15,000 K over ~220 ns as τ~(-0.22), consistent with radiative losses and adiabatic gas expansion of a relatively free plasma. Simultaneous emission lines from Si(Ⅱ) associated with the plasma etching of the SiO_2 substrate were observed yielding higher plasma temperatures, ~35,000 K, relative to the Fe(Ⅰ) plasma. The difference in species temperatures is consistent with plasma confinement at the microsphere-substrate interface as the particle is ejected, and is directly visualized using pump-probe shadowgraphy as a function of pulsed laser energy.
机译:表面对光学污染的污染可能导致激光诱导的损伤,因此限制了高功率激光系统的性能。在这项工作中,我们专注于了解导致金属污染物损害引起的基本机制。使用时间分辨的显微镜和等离子体光谱,我们研究了用1064nm,10ns和355 ran,8ns激光脉冲照射的熔喷二氧化硅衬底的出口表面喷射〜30μm不锈钢颗粒的动态过程。时间分辨的等离子体发射光谱法用于表征与单一,10-ns脉冲激光烧蚀的能量耦合和温度升高,所述金属颗粒与透明基板结合的金属颗粒。与Fe(Ⅰ)源自钢微球的发射线相关的血浆观察到〜24,000k至〜15,000k〜220ns〜220ns,符合相对自由等离子体的辐射损耗和绝热气体膨胀一致。观察到与SiO_2基板的等离子体蚀刻相关的Si(Ⅱ)的同时发射线,相对于Fe(Ⅰ)等离子体,〜35,000 k升高,〜35,000k。物种温度的差异与微球基板接口处的等离子体限制一致,因为颗粒被喷射,并且使用泵探针阴影图像直接可视化,作为脉冲激光能量的函数。

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