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Negative differential conductivity in AlGaN/GaN HEMTs: real space charge transfer from 2D to 3D GaN states?

机译:AlGaN / GaN HEMT中的负差分电导率:从2D GaN态到3D GaN态的真实空间电荷转移?

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We report on non-thermal negative differeential conductivity (NDC) in AlGaN/GaN HEMTs grown on sapphire substrates by low-pressure MOCVD. The sheet electron density was on the order of few times 10~(12) cm~(-2) and the Hall mobility was, 1, 000 cm~2/V.s. The HEMTs had threshold voltage close to zero and could operate at high positive gate bias up to 3 to 3.5 Volts, with a very low gate leakage current. NDC was observed at the gate bias larger than 1.5V and at the drain biases between approximately 0.5Vg and Vg. We excluded the possibility of self-heating as the cuase, since the NDC occurs at relatively small power levels where self-heating effects are neglighibe.
机译:我们报告了通过低压MOCVD在蓝宝石衬底上生长的AlGaN / GaN HEMT中的非热负差电导率(NDC)。薄层电子密度约为10〜(12)cm〜(-2)的几倍,霍尔迁移率约为1,000 cm〜2 / V.s。 HEMT的阈值电压接近零,并且可以在高达3至3.5伏的高正栅极偏置下工作,并且栅极泄漏电流非常低。在大于1.5V的栅极偏压和大约0.5Vg至Vg的漏极偏压下观察到NDC。我们排除了自热的可能性,因为NDC发生在相对较小的功率水平,而自热效应可忽略不计。

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