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Rutherford backscattering and channeling studies of Al and Mg diffusion in iron oxide thin films

机译：Rutherford对Al和Mg在氧化铁薄膜中扩散的反向散射和沟道研究

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Thin films of alpah -Fe_2O_3(0001) (hematite) and gamma -Fe_2O_3 (001) (maghemite) were epitaxially grown on Al_2O_3(0001) and MgO(001) substrates, respectively, using the new molecular beam epitaxy (MBE) system at he Environmental Molecular sciences Laboratory (EMSL). We have investigated the crystalline quality of these films using Rutherford Backscattering (RBS) and channeling expeirments. Minimum yields obtained fromn aligned and random spectra are 2.7+-0.3

机译：使用新型分子束外延（MBE）系统分别在Al_2O_3（0001）和MgO（001）衬底上外延生长Alpha-Fe_2O_3（0001）（赤铁矿）和γ-Fe_2O_3（001）（磁赤铁矿）薄膜。他是环境分子科学实验室（EMSL）。我们已经使用卢瑟福背散射（RBS）和沟道实验研究了这些薄膜的晶体质量。从对齐和随机光谱获得的最小产量为2.7 + -0.3

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《International conference on application of accelerators in research and industry 》|1998年|p.508-511|共4页
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S.Thevuthasan; D.E.McCready; W.Jiang; E.D.McDaniel; S.I.Yi; S.A.Chambers;
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4. Rutherford backscattering and channeling studies of Al and Mg diffusion in iron oxide thin films [C] . S.Thevuthasan, D.E.McCready, W.Jiang, International conference on application of accelerators in research and industry . 1999

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机译：二氧化硅中的镓扩散。薄膜的卢瑟福背散射分析。

Rutherford backscattering and channeling studies of Al and Mg diffusion in iron oxide thin films

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