Abstract: This paper gives the experimental evidences to establish a new electrochromism for the nickel oxide films deposited by rf reactive sputtering. ESCA results indicate that all the films in as-deposited, colored, and bleached states are nonstoichiometric nickel oxide with different oxidation states and there is no evidence to support the existence of nickel hydroxide in the three states. SIMS has been used to analyze the injected Li$+$PLU$/ concentration in these films. The relative content of Li in films is 0 for as-deposited, 1.3 for colored, and 4.0 for bleached. Li$+$PLU$/ implantation has been used to initially bleach the dark as-deposited films. The results indicate that the as-deposited films can be bleached by Li$+$PLU$/ implantation. A new electrochromic reaction model for the reactively sputtered nickel oxide films has been proposed. !6
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机译：摘要：本文为通过射频反应溅射沉积氧化镍膜建立新的电致变色现象提供了实验证据。 ESCA结果表明，所有处于沉积，着色和漂白状态的薄膜都是具有不同氧化态的非化学计量的氧化镍，没有证据支持这三种状态下氢氧化镍的存在。 SIMS已用于分析这些薄膜中注入的Li $ + $ PLU $ /浓度。薄膜中Li的相对含量为沉积时为0，有色为1.3，漂白为4.0。 Li ++ PLU $ /注入已被用来最初漂白沉积的深色薄膜。结果表明，沉积的薄膜可以通过Li $ + $ PLU $ /注入进行漂白。提出了一种新的反应溅射氧化镍薄膜的电致变色反应模型。 ！6
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