This paper gives the experimental evidences to establish a new electrochromism for the nickel oxide films deposited by rf reactive sputtering. ESCA results indicate that all the films in as-deposited, colored, and bleached states are nonstoichiometric nickel oxide with different oxidation states and there is no evidence to support the existence of nickel hydroxide in the three states. SIMS has been used to analyze the injected Li$+$PLU$/ concentration in these films. The relative content of Li in films is 0 for as-deposited, 1.3 for colored, and 4.0 for bleached. Li$+$PLU$/ implantation has been used to initially bleach the dark as-deposited films. The results indicate that the as-deposited films can be bleached by Li$+$PLU$/ implantation. A new electrochromic reaction model for the reactively sputtered nickel oxide films has been proposed.
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机译：本文给出了实验证据，为RF反应溅射沉积的氧化镍膜建立了新的电致变色。 ESCA结果表明，所有沉积，有色和漂白状态的所有薄膜都是具有不同氧化状态的非核实镍氧化物，并且没有证据表明在三种状态下支持氢氧化镍的存在。 SIMS已被用于分析这些电影中注入的LI $ + $ PLU /浓度。薄膜中的Li的相对含量为0.对于沉积的1.3，对于漂白剂，1.3。李$ + $ PLU $ /植入已被用于最初漂白黑暗的沉积电影。结果表明，沉积的薄膜可以被李$ + $ PLU $ /植入漂白。已经提出了一种用于反应溅射氧化镍膜的新型电致变色反应模型。
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