Development of Scanning Probe Parallel Nanowriting System with Electron Beam Resist

摘要

This study directed to establish a parallel nanowriting technique for an electron beam (EB) resist by multi-probe cantilevers. We newly developed the scanning probe parallel nanowriting system. This system has multi-probe cantilevers with thermal actuators for on-off switching contact between the probe and the substrate. In order to apply this system to nanopatterning an EB resist, we found out the suitable resist formation and the nanowriting conditions using a single probe cantilever. Consequently, we succeeded in obtaining line patterns with a width of 50 nm and a height of 50 nm.