首页> 外国专利> Iridium tip, gas field ionization ion source, focused ion beam apparatus, electron source, electron microscope, electron beam applied analysis apparatus, ion electron composite beam apparatus, scanning probe microscope, and mask correction apparatus

Iridium tip, gas field ionization ion source, focused ion beam apparatus, electron source, electron microscope, electron beam applied analysis apparatus, ion electron composite beam apparatus, scanning probe microscope, and mask correction apparatus

机译:铱尖端,气体场电离离子源,聚焦离子束装置,电子源,电子显微镜,电子束施加分析装置,离子电子复合束装置,扫描探针显微镜和掩模校正装置

摘要

There is provided an iridium tip including a pyramid structure having one {100} crystal plane as one of a plurality of pyramid surfaces in a sharpened apex portion of a single crystal with 210 orientation. The iridium tip is applied to a gas field ion source or an electron source. The gas field ion source and/or the electron source is applied to a focused ion beam apparatus, an electron microscope, an electron beam applied analysis apparatus, an ion-electron multi-beam apparatus, a scanning probe microscope or a mask repair apparatus.
机译:提供了一种铱尖端,其在具有<210>取向的单晶的尖锐顶部中包括具有一个{100}晶面作为多个金字塔表面之一的金字塔结构。铱尖端被施加到气体场离子源或电子源。气场离子源和/或电子源应用于聚焦离子束设备,电子显微镜,施加电子束的分析设备,离子电子多束设备,扫描探针显微镜或掩模修复设备。

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