ferroelectric thin films; bismuth compounds; lanthanum compounds; sol-gel processing; X-ray diffraction; crystal microstructure; surface morphology; grain growth; random-access storage; lanthanum-substituted bismuth titanate; ferroelectric thin films; FeRAM application; polycrystalline thin films; c-orientated thin films; BLT thin films; modified sol-gel technique; X-ray diffraction; microstructure; surface morphologies; grain growth; grain orientation; ferroelectric properties; remanent polarization; c-axis orientation ratio; Bi/sub 3.4/La/sub 0.6/Ti/sub 3/O/sub 12/;
机译:氧等离子体处理对镧取代钛酸铋铁电薄膜的影响
机译:使用错切的氧化钇稳定的氧化锆衬底减少外延铁电镧取代钛酸铋薄膜中的方位域
机译:FeRAM器件用钛酸铋铋(Bi_(3.25)La_(0.75)Ti_3O_(12))薄膜的制备与表征
机译:钛酸盐铁型铁电薄膜钛酸铋铋的表征与性能
机译:稀土(Pi =铈,、,)取代的钛酸铋Pi(x)薄膜:合成,结构和铁电性能。
机译:超薄铁电薄膜:生长表征物理和应用
机译:错误:“硅基衬底上均匀的A轴导向铁电镧的钛酸铋膜的增长”J。苹果。物理。 93,5592(2003)
机译:铁电铋钛酸盐外延膜的生长与性能