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Characterization and properties of lanthanum-substituted bismuth titanate ferroelectric thin films for FeRAM application

机译:FeRAM应用中镧取代钛酸铋铋铁电薄膜的表征与性能

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In the paper, polycrystalline and c-orientated Bi/sub 3.4/La/sub 0.6/Ti/sub 3/O/sub 12/ (BLT) thin films with uniform composition and thickness were prepared on Si and Pt/Ti/SiO/sub 2//Si substrates using a modified sol-gel technique. X-ray diffraction (XRD) studies indicated the formation of the Bi-based layered structure for BLT. The microstructure and surface morphologies of thin films significantly vary with the type of substrates. The grain growth and orientation of BLT thin films in different substrates intensively affect on the ferroelectric properties. The remanent polarization (P/sub r/) of BLT thin films on Pt/Ti/SiO/sub 2//Si and Si substrates is about 1.23 /spl mu/C/cm/sup 2/ and 4.54 /spl mu/C/cm/sup 2/, respectively. The higher the c-axis orientation ratio of BLT films, the less the value of P/sub r/ is. The fatigue properties remain nearly constant after 1.44/spl times/10/sup 12/ switching cycles. It indicates that lanthanum-substituted bismuth titanate is a kind of candidate material for FeRAM application.
机译:本文在Si和Pt / Ti / SiO /上制备了多晶且c取向的Bi / sub 3.4 / La / sub 0.6 / Ti / sub 3 / O / sub 12 /(BLT)薄膜,其成分和厚度均一。使用改进的溶胶-凝胶技术的sub 2 // Si衬底。 X射线衍射(XRD)研究表明BLT的Bi基层状结构的形成。薄膜的微观结构和表面形态会随着基材的类型而显着变化。 BLT薄膜在不同衬底中的晶粒生长和取向强烈影响铁电性能。 Pt / Ti / SiO / sub 2 // Si和Si基板上BLT薄膜的剩余极化(P / sub r /)分别约为1.23 / spl mu / C / cm / sup 2 /和4.54 / spl mu / C / cm / sup 2 /。 BLT膜的c轴取向率越高,P / sub r /的值越小。在1.44 / spl次/ 10sup 12 /切换循环后,疲劳性能几乎保持不变。这表明镧取代钛酸铋是一种可用于FeRAM的候选材料。

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