首页> 外国专利> Bismuth-cerium Titanate Thin Film for Capacitor of Ferroelectric Random Access Memory

Bismuth-cerium Titanate Thin Film for Capacitor of Ferroelectric Random Access Memory

机译:铁电随机存取存储器电容器用钛酸铋铈薄膜

摘要

PURPOSE: A £Bi,Ce|4Ti3O12 membrane for capacitor of a non-volatile ferroelectric RAM is provided to reduce a fatigue phenomenon of the membrane by using an improved £Bi,Ce|4Ti3O12 membrane. CONSTITUTION: A titanium precursor and a mixture of a bismuth precursor having Ce/(Ce+Bi) of 0.01 to 0.99 and a cerium precursor are deposited on a substrate under a temperature of 30 to 800 degrees centigrade and a pressure of 1x10¬-9 Torr to 100atm by using a wet deposition method and a dry deposition method. A thermal process for the deposited membrane is performed under a thermal rising ratio of 100 to 600 degrees centigrade per minute and the temperature of 200 to 800 degrees centigrade. An LSMCD(Liquid Source Misted Chemical Deposition) method using an organic solvent, a sol-gel method or a metal organic decomposition method are used as the wet etch method.
机译:用途:提供一种用于非易失性铁电RAM的电容器用£Bi,Ce | 4Ti3O12膜,以通过使用改进的£Bi,Ce | 4Ti3O12膜来减少膜的疲劳现象。组成:将钛前体和Ce /(Ce + Bi)为0.01至0.99的铋前体与铈前体的混合物在30至800摄氏度的温度和1x10¬-9的压力下沉积在基板上通过使用湿式沉积法和干式沉积法将其托至100atm。沉积膜的热处理是在每分钟100至600摄氏度的热上升率和200至800摄氏度的温度下进行的。使用有机溶剂的LSMCD(液体源雾化化学沉积)方法,溶胶-凝胶法或金属有机分解方法被用作湿蚀刻法。

著录项

  • 公开/公告号KR100371055B1

    专利类型

  • 公开/公告日2003-02-05

    原文格式PDF

  • 申请/专利权人

    申请/专利号KR20010020068

  • 发明设计人 우성일;정현진;

    申请日2001-04-14

  • 分类号H01L27/108;

  • 国家 KR

  • 入库时间 2022-08-21 23:45:46

相似文献

  • 专利
  • 外文文献
  • 中文文献
获取专利

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号