silicon; lithium compounds; sputtered coatings; dielectric materials; dielectric thin films; wave propagation; surface acoustic wave devices; electrodeposits; permittivity; thermal stability; material parameters; rf magnetron sputtering; temperature stable saw device; SAW propagation characteristics; surface acoustic waves; delay temperature coefficient; layered structure; deposited film; dielectric constant; elastic constants; dielectric material; dielectric thin films; 128 degC; SiO/sub 2/-LiNbO/sub 3/;
机译:高频表面声波器件的射频磁控溅射在具有Al_2O_3缓冲层的SiO_2 / Si衬底上沉积ZnO薄膜
机译:射频磁控溅射低温合成取向CoPtCu-MgO和CoFePt-Ag-SiO2纳米复合薄膜
机译:室温离轴射频磁控溅射沉积SiO_2-Al_2O_3混合相薄膜的介电性能
机译:RF磁控溅射SiO / Sub 2 /薄膜的材料参数,用于温度稳定SiO / Sub 2 // Linbo / Sub 3 / Saw器件
机译:射频反应磁控溅射在低温下沉积在硅上的压电氮化铝薄膜的声波器件特性
机译:氧浓度对超薄射频磁控溅射沉积铟锡氧化物薄膜作为光伏器件上电极的性能的影响
机译:低温生长过程中等离子体产生的负氧离子撞击对磁控溅射非晶SiO 2薄膜的影响