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Effect of the nucleation process on freestanding AlN/diamond SAW filter characteristics

机译:成核过程对独立式AlN /金刚石SAW滤波器特性的影响

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In this work, the effect of diamond nucleation process on freestanding AlN/diamond SAW device performances was studied. Before diamond deposition, silicon substrate were mechanically nucleated, using an ultrasonic vibration table with sub-micron diamond slurry, and bias enhanced nucleated (BEN). Freestanding diamond layers obtained on mechanically scratched Si substrates exhibit a surface roughness of R/sub MS/=13nm whereas very low surface roughness (as low as R/sub MS//spl les/1 nm) can be achieved on BEN diamond layer. Propagation losses (/spl alpha/) and electromechanical coupling coefficient (K/sup 2/) have been measured as a function of the operating frequency and the normalized AlN film thickness (kh/sub AlN/=2/spl pi/h/sub AlN///spl lambda/). Experimental results show that the propagation losses strongly depend on nucleation technique while the electromechanical coupling coefficient slightly depends on nucleation technique.
机译:在这项工作中,研究了金刚石成核过程对独立式AlN /金刚石SAW器件性能的影响。在金刚石沉积之前,使用具有亚微米级金刚石浆料的超声振动台对硅基板进行机械成核,并使用偏光增强成核(BEN)技术。在机械刮擦的Si基板上获得的独立金刚石层的表面粗糙度为R / sub MS / = 13nm,而在BEN金刚石层上可以实现非常低的表面粗糙度(低至R / sub MS // spls / 1 nm)。测量了传播损耗(/ spl alpha /)和机电耦合系数(K / sup 2 /)作为工作频率和归一化AlN膜厚度的函数(kh / sub AlN / = 2 / spl pi / h / sub AlN /// spl lambda /)。实验结果表明,传播损耗在很大程度上取决于成核技术,而机电耦合系数在一定程度上取决于成核技术。

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