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The fabrication and characterization of nano-aperture VCSEL array head for high density near-field optical data storage

机译:用于高密度近场光学数据存储的纳米孔径VCSEL阵列头的制造与表征

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A 2D nano-aperture VCSEL array head of near-field optics was studied with the formation of small aperture on the VCSEL surface after the deposition of dielectric and metal films. Its optical properties were also characterized to apply the VCSEL array for the near-field optical memory system of higher data capacity and speed. In this study, we could produce very small aperture of around 50 nm in diameter successfully using a focused ion beam (FIB) method, and get the reasonable increasement in the laser power with the formation of nano-aperture on each VCSEL emitting surface.
机译:研究了近场光学器件的二维纳米孔径VCSEL阵列头,在沉积电介质和金属膜后,在VCSEL表面形成了小孔径。其光学特性还被表征为将VCSEL阵列应用于具有更高数据容量和速度的近场光学存储系统。在这项研究中,我们可以使用聚焦离子束(FIB)方法成功产生直径约50 nm的非常小的孔径,并通过在每个VCSEL发射表面上形成纳米孔来获得合理的激光功率增加。

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