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Influence of annealing treatment on the ferroelectric and piezoelectric properties of PZT thin films grown on silicon substrates by sputtering

机译:退火处理对通过溅射在硅衬底上生长的PZT薄膜的铁电和压电性能的影响

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The influence of growth conditions and post-annealing treatment on rf-magnetron sputtered lead zirconate titanate (PZT) thin films has been investigated, and the structural, microstructural and electrical properties have been examined. Perovskite structure was obtained by conventional annealing as well as by Rapid Thermal Annealing (RTA). The structure and the microstructure of the films are directly related to the thermal process. The films were dense and crack-free. The ferroelectric properties and the fatigue are very sensitive to the annealing treatment. The piezoelectric properties of PZT films have been evaluated by the embedded beam method. The results show that PZT films grown by sputtering can be used to realize micro-actuators/sensors devices on silicon substrates.
机译:研究了生长条件和后退火处理对射频磁控溅射锆钛酸铅钛酸酯(PZT)薄膜的影响,并研究了其结构,微结构和电性能。通过常规退火以及通过快速热退火(RTA)获得钙钛矿结构。薄膜的结构和微观结构与热过程直接相关。膜致密且无裂纹。铁电性能和疲劳度对退火处理非常敏感。 PZT薄膜的压电性能已通过嵌入束法进行了评估。结果表明,通过溅射生长的PZT薄膜可用于在硅衬底上实现微致动器/传感器装置。

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