micromechanical resonators; piezoelectric thin films; thin films; crystal microstructure; X-ray diffraction; sputtering; atomic force microscopy; electron microscopy; surface topography; electrodes; aluminium compounds; silicon; reactive AC magnetron sputtering; metrology techniques; surface quality; atomic force microscopy; X-ray diffraction; electron microscopy; substrate coatings; film crystallinity; first order approximation; c-axis misorientation; mosaic-structured wurtzite film; FWHM; piezoelectric properties; MEMS resonators; thin films; film properties; microstructure; piezoelectric performance; AlN-Si;
机译:表面近硅衬底性能对溅射沉积AlN薄膜微观结构的影响
机译:MEMS应用溅射AlN薄膜的压电特性和残余应力
机译:用于薄膜体声波谐振器的沉积在Mo电极上的AlN薄膜的性能表征
机译:SI和电极上的溅射ALN薄膜,用于MEMS谐振器:表面质量微观结构和薄膜性能之间的关系
机译:镧镍氧化物电极上MOCVD衍生的钙钛矿铅锆(x)钛(1-x)氧(3)和铅(scan钽)(1-x)钛(x)氧(3)薄膜的微观结构和电性能缓冲硅
机译:AlN中间层对大功率脉冲磁控溅射SiC薄膜结构和化学性能的影响
机译:溅射沉积的ZnO:Al薄膜作为薄膜硅太阳能电池的前电极的湿化学表面纹理
机译:用于微波应用的原位射频溅射YBa2Cu3O7薄膜的微观结构和性能