The antimony-doped tin (ATO) thin films were deposited on glass substrates with and without SiO2-coated by sol-gel process with annealing temperature of 450亷. The structural, electrical and optical properties of the thin films were studied in details. The X-ray diffraction (XRD) analysis revealed that the thin films retained the tetragonal rutile structure as undoped ones. The sheet resistivity decreased obviously with the increase of the thickness, which was around 129/仩 with the thickness of about 95nm. The average transmittance in the visible range was above 65%, and the reflectance in the infrared range for ATO films on Si substrates increased from 20% to 40% with the increase of the wavelength.
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