Soft imprint lithography for pixel array manufacturing in OLED

机译：用于OLED像素阵列制造的软压印光刻

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A soft imprint lithography(IL) process is presented to fabricate the pixel array pattern for organic light-emitting diodes. In this study, we successfully fabricate the OLED pixel array of sizes from 50驴m to 5驴m.

机译：提出了一种软压印光刻技术，以制造用于有机发光二极管的像素阵列图案。在这项研究中，我们成功地制作了尺寸从50微米到5微米的OLED像素阵列。

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《》|2007年|288-289|共2页
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Wang; Chenglong; Fan; Duowang; Liu; Hongzhong;
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3. High Resolution Black Color Patterns Fabricated by Photo-Lithography with a Novel High Adhesion Polymer for Pixel Defining Layer of OLED [J] . Myungjun Lee, Jun Bae, Seonhong Ahn, SID International Symposium: Digest of Technology Papers . 2018 ,第3期

机译：通过光刻制造的高分辨率黑色图案，具有新的高附着聚合物，用于像素限定OLED层
4. Soft imprint lithography for pixel array manufacturing in OLED [C] . Chenglong Wang, Duowang Fan, Hongzhong Liu International Nano-Optoelectronic Workshop; 20070729-0811; Beijing and Lanzhou(CN) . 2007

机译：用于OLED像素阵列制造的软压印光刻
5. Step and Flash Imprint Lithography: Materials and applications for the manufacture of advanced integrated circuits. [D] . Palmieri, Frank Louis, III. 2008

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Soft imprint lithography for pixel array manufacturing in OLED

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