thin films; amorphous state; electron field emission; plasma CVD; substrates; electric fields; scanning electron microscopes; X-ray photoelectron spectra; Raman spectroscopy; bonds (chemical); elemental semiconductors; current density; silicon; carbon; sp2/sp3 bonding ratio; field emission property; amorphous carbon films; microwave plasma chemical vapor deposition; surface bonding; surface microstructure; scanning electron microscope; X-ray photoelectron spectroscopy; Raman spectroscopy; field emission measurements; vacuum chamber; emission conditioning treatment; I-V characteristic; electric field; current density;
机译:使用X射线吸收光谱法测定碳膜的sp2 / sp3键合浓度
机译:sp〜2 / sp〜3键合比例对微波等离子体化学气相沉积法生长类金刚石碳膜场发射性能的影响
机译:通过高压阳极真空等离子体中的沉积参数调整类金刚石碳膜中的sp 2 sup> / sp 3 sup>比
机译:碳膜表面SP2 / SP3键合比对场发射特性的影响
机译:碳纳米管薄膜的合成和场发射特性。
机译:非晶氢化碳膜(a-C:H)精制可持续的聚己二酸对苯二甲酸丁二醇酯(PBAT)揭示了膜厚度随sp2 / sp3比率变化而变化的不稳定性
机译:长宽比和sp2 / sp3含量对Ns掺杂pECVD生长碳膜场发射性质的影响
机译:长径比和sp2 / sp3含量对Ns掺杂pECVD生长碳膜场发射性能的影响