首页> 外文会议> >The breakthrough in data retention time of DRAM using Recess-Channel-Array Transistor(RCAT) for 88 nm feature size and beyond
【24h】

The breakthrough in data retention time of DRAM using Recess-Channel-Array Transistor(RCAT) for 88 nm feature size and beyond

机译:使用嵌入式通道阵列晶体管(RCAT)的DRAM在数据保持时间方面的突破性突破,可实现88 nm及更大的特征尺寸

获取原文

摘要

For the first time, 512 Mb DRAMs using a Recess-Channel-Array-Transistor(RCAT) are successfully developed with 88 nm feature size, which is the smallest feature size ever reported in DRAM technology with non-planar array transistor. The RCAT with gate length of 75 nm and recessed channel depth of 150 nm exhibits drastically improved electrical characteristics such as DIBL, BV/sub DS/, junction leakage and cell contact resistance, comparing to a conventional planar array transistor of the same gate length. The most powerful effect using the RCAT in DRAMs is a great improvement of data retention time. In addition, this technology will easily extend to sub-70 nm node by simply increasing recessed channel depth and keeping the same doping concentration of the substrate.
机译:首次成功开发了使用嵌入式通道阵列晶体管(RCAT)的512 Mb DRAM,其特征尺寸为88 nm,这是有报道的非平面阵列晶体管DRAM技术中最小的特征尺寸。与相同栅极长度的传统平面阵列晶体管相比,栅极长度为75 nm的凹陷通道深度为150 nm的RCAT的电气特性得到了显着改善,例如DIBL,BV / sub DS /,结泄漏和单元接触电阻。在DRAM中使用RCAT的最强大作用是极大地缩短了数据保留时间。另外,通过简单地增加凹陷的沟道深度并保持相同的衬底掺杂浓度,该技术将很容易扩展到70 nm以下的节点。

著录项

相似文献

  • 外文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号