Low temperature DC plasma CVD diamond and diamond-like carbon thin films

摘要

Summary form only given. Diamond and diamond like carbon (DLC) films were deposited on silicon wafer at relatively low substrate temperatures ranging from 175 /spl deg/C to 275 /spl deg/C by dc plasma chemical vapor deposition. Substrates were placed on a molybdenum cap holder enveloped by a controlled heater rated at 200 watts Hydrogen (H/sub 2/) and methane (CH/sub 4/) were used as gas reactants in varying ratios from 1-5% volume CH/sub 4/ in a total gas filling pressure of 10 Torr. Deposition times ranged from 5 to 15 hours. Raman spectroscopy, X-ray diffraction (XRD), and scanning electron microscopy confirmed the produced films. The Raman and XRD results indicating the transition from DLC to diamond film under certain deposition conditions are discussed via a model involving the reaction of hydrogen in the growth process of these films.