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Diamond-like carbon thin films prepared by pulsed-DC PE-CVD for biomedical applications

机译:通过脉冲直流PE-CVD制备的生物医学应用的类金刚石碳薄膜

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In the present research, diamond-like carbon (DLC) thin films were applied on steel substrates by means of pulsed-direct current (DC) plasma-enhanced chemical vapor deposition (PE-CVD). The effects of bias voltage and deposition pressure on the films' structure and properties were investigated. The Raman spectra of the films revealed features typical of G and D bands, indicating the formation of a DLC phase. The results demonstrate that the sp(3) carbon fraction or the so-called diamond-like character of the DLC films increased with increasing bias voltage. Moreover, an increase in the bias voltage resulted in a decrease in the film thickness from 800 to 200 nm. Also, the DLC films prepared at a higher deposition pressure showed a higher fraction of sp(2)-bonded carbon - that is, graphitic domains. Furthermore, it was found that the variation in the bias voltage and deposition pressure also affected the internal stress values of the DLC films in a way that they increased from 1 to 11GPa when the bias voltage was increased from 475 to 675 V. The effectiveness of DLC films formed on the steel substrates can pave the way for developing a new class of advanced materials to enhance the performance of stainless steel for biomedical applications.
机译:在本研究中,类金刚石碳(DLC)薄膜通过脉冲直流(DC)等离子体增强化学气相沉积(PE-CVD)应用于钢基底。研究了偏压和沉积压力对薄膜结构和性能的影响。薄膜的拉曼光谱显示出G和D波段的典型特征,表明形成了DLC相。结果表明DLC膜的sp(3)碳含量或所谓的类金刚石特性随偏置电压的增加而增加。此外,偏置电压的增加导致膜厚度从800nm减小到200nm。同样,在较高沉积压力下制备的DLC膜显示出更高比例的sp(2)-键合碳-即石墨域。此外,已发现,偏置电压和沉积压力的变化也以下列方式影响了DLC膜的内部应力值:当偏置电压从475 V升高到675 V时,DLC膜的内部应力值从1 GPa升高到11GPa。在钢基材上形成的DLC膜可为开发新型先进材料铺平道路,以增强生物医学应用中不锈钢的性能。

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