Study of magnetron sputtering of vanadium oxide thin films

机译：磁控溅射氧化钒薄膜的研究

获取原文

页面导航

摘要
著录项
相似文献
相关主题

摘要

In this paper, the influence of different sputtering processes on square resistance of thin films has been discussed; the temperature coefficient of resistance (TCR) and the square resistance R/spl square/ of thin films were tested and analyzed. The proper technology parameter is found. At last, the composition of the films was analyzed by the XPS.

机译：本文讨论了不同溅射工艺对薄膜平方电阻的影响;测试并分析了电阻温度（TCR）和薄膜的方形电阻R / SPL平方系数。找到了正确的技术参数。最后，通过XPS分析薄膜的组成。

著录项

来源
《》|2002年|p.346-348|共3页
会议地点
作者
Wu; Z.M.; Xie; G.Z.; Mu; H.; Wang; T.; Xu; J.H.; Huang; C.H.; Jiang; Y.D.;
展开▼
作者单位

展开▼
会议组织
原文格式 PDF
正文语种
中图分类无线电电子学、电信技术;
关键词
sputtered coatings; vanadium compounds; electrical resistivity; X-ray photoelectron spectra; magnetron sputtering; vanadium oxide thin film; square resistance; temperature coefficient of resistance; XPS; chemical composition; VO;

机译：溅射镀层;钒化合物;电阻率; X射线光电子能谱;磁控溅射;氧化钒薄膜;方电阻;电阻温度系数; XPS;化学成分; VO;

相似文献

外文文献
中文文献
专利

1. Vanadium Dioxide and Vanadium Sesquioxide Thin Films Fabricated on (0001) or (1010)Al_2O_3 by Reactive RF-Magnetron Sputter Deposition and Subsequent Annealing Processes [J] . Sun Jin Yun, Jung Wook Lim, Jong-Su Noh, Japanese journal of applied physics . 2009,第4issue2期

机译：反应射频磁控溅射沉积及后续退火工艺在（0001）或（1010）Al_2O_3上制备二氧化钒和七氧化二钒薄膜
2. Growth mode and texture study in vanadium dioxide thin films deposited by magnetron sputtering [J] . Wei XB, Wu ZM, Xu XD, Journal of Physics, D. Applied Physics: A Europhysics Journal . 2008,第5期

机译：磁控溅射沉积二氧化钒薄膜的生长方式和织构研究
3. Evaluation of the nanomechanical properties of vanadium and native oxide vanadium thin films prepared by RF magnetron sputtering [J] . Mamun M. A., Zhang K., Baumgart H., Applied Surface Science . 2015,第DECa30期

机译：射频磁控溅射制备钒和天然氧化物钒薄膜的纳米力学性能评估
4. Study of magnetron sputtering of vanadium oxide thin films [C] . Z. M. Wu, G. Z. Xie, H. Mu, International Symposium on Electrets . 2002

机译：氧化钒薄膜磁控溅射研究
5. Preparation, characterization and post-deposition modification of pulsed-dc magnetron sputtered Vanadium Oxide thin films for microbolometer applications [D] . Venkatasubramanian, Chandrasekaran 2010

机译：用于微辐射热计应用的脉冲直流磁控溅射氧化钒薄膜的制备，表征和沉积后修饰
6. Spatially Resolved Optoelectronic Properties of Al-Doped Zinc Oxide Thin Films Deposited by Radio-Frequency Magnetron Plasma Sputtering Without Substrate Heating [O] . Eugen Stamate 2020

机译：在不加热衬底的情况下通过射频磁控等离子体溅射沉积的铝掺杂氧化锌薄膜的空间分辨光电性能
7. Characterization of R.F. Magnetron Sputtered Vanadium Oxide Thin Films and Intercalation of Lithium in the Oxide Films [O] . Naoaki KUMAGAI, Shinichi KOMABA, Osamu NAKANO, 2004

机译：R.F的特征。磁控溅射氧化钒薄膜和氧化锂锂的插入

Study of magnetron sputtering of vanadium oxide thin films

摘要

著录项

相似文献

相关主题

期刊订阅