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Young's modulus evaluation of Si thin film fabricated by compatible process with Si MEMSs

机译:与Si MEME兼容的处理器制造的Si薄膜的杨氏模量评估

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In this paper, in-situ evaluation of a Young's modulus for a polycrystalline Si (poly-Si) thin film on a PSG (Phosphorous doped silica glass) sacrifice layer is demonstrated based on the pull-in voltage of a cantilever, which is easily prepared during the MEMS's fabrication process.
机译:在本文中,基于悬臂的引入电压,论证了在PSG(磷掺杂石英玻璃)牺牲层上对多晶Si(poly-Si)薄膜的杨氏模量的原位评估。在MEMS的制造过程中准备的。

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