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High density, plasma flood system (HD PFS) yield enhancement for the precision implant 9500

机译：高密度等离子溢流系统（HD PFS）提高了精密植入物9500的产量

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Thinner gate insulators and larger effective antenna ratios require continuous improvement of charging control for leading edge devices. A beta version of the HD PFS demonstrated a yield advantage over the original 9500 PFS with new products. Split lots were run for high current implant of 0.50 micron EEPROM devices with a 10 nm gate oxide insulator. Initial beta service life was one month. Expected filament life is significantly longer.

机译：较薄的栅极绝缘体和较大的有效天线比率需要不断改进前沿设备的充电控制。 HD PFS的Beta版在新产品方面比原始的9500 PFS具有更高的产量优势。对具有10 nm栅极氧化物绝缘体的0.50微米EEPROM器件的大电流注入进行了分批处理。最初的测试版使用寿命为一个月。预期的灯丝寿命明显更长。

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《》|1998年|P.541-542|共2页
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Sempek; D.; Ito; H.;
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中图分类无线电电子学、电信技术;
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High density, plasma flood system (HD PFS) yield enhancement for the precision implant 9500

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