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Experimental investigation of the doping profile and structure of InGaAsP/InP multiple quantum wells after rapid thermal annealing

机译:快速热退火后InGaAsP / InP多量子阱的掺杂分布和结构的实验研究

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Abstract: The influence of rapid thermal annealing (RTA) on the doping profile and the structure of quantum well LD have been investigated by means of Hall measurement, Auger Electron Spectroscopy, and Secondary Ion Mass Spectroscopy methods after certain RTA. It has been discovered that high resistivity layer was formed at the ohmic contact layer after RTA. However, the structure of quantum well LD is not influenced by RTA. !539
机译:摘要:通过霍尔测量,俄歇电子能谱和二次离子质谱法研究了快速热退火(RTA)对掺杂分布和量子阱LD结构的影响。已经发现在RTA之后在欧姆接触层上形成高电阻率层。但是,量子阱LD的结构不受RTA的影响。 !539

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