Joint development of a topography simulator at National Semiconductor Corporation and Arizona State University

摘要

A joint effort between Arizona State University, Tempe, and National Semiconductor Corporation to bring academic research work from a University to the every-day's work at a real production line has been carried out. Ti and TiN sputter deposition processes-collimated as well as uncollimated were studied. By succeeding and exceeding the initial expectations we could demonstrate that theoretical work can be definitely of great value to practical applications. A product has been developed which allows the process engineer a fast and accurate study of the results of changes in various process parameters as well as to monitor the current process.