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BEST2-a high performance super self-aligned 3 V/5 V BiCMOS technology with extremely low parasitics for low-power mixed-signal applications

机译:BEST2-一种高性能超自对准3 V / 5 V BiCMOS技术,具有极低的寄生效应,适用于低功率混合信号应用

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We present AT&T BEST2 a high performance BiCMOS technology designed for supporting low-power multi-GHz mixed-signal applications. Processing modules reported include novel device structure fabrication, selective-epitaxy-capping of As buried layer, and deep fully-recessed LOCOS isolation. The developed process with relaxed design rules has achieved f/sub t/ and f/sub max/ for npn bipolar (A/sub e/=1/spl times/2 um/sup 2/) or 23 GHz and 24 GHz at V/sub ce/=3 V, respectively. With BV/sub ceo//spl ges/5.5 volts, and /spl beta/V/sub A/ product of 2400. Typical/minimum ECL gate delays are measured 48 ps/37 ps (A/sub e/=1/spl times/2 um/sup 2/: 500 mV swing) at 0.6 mA/2.1 mA stage current, and CMOS gate delay (gate oxide=125 A/spl deg/, L/sub eff/=0.6 um; V/sub th,nch/=0.45 V; V/sub th,pch/=-0.45 V) 70 ps/stage. BiCMOS phase-locked-loop (emitter width=1 um; gate L/sub eff/=0.7 um) has achieved a world record of 6 GHz operation at 2 V power supply with total power consumption of 60 mW.
机译:我们向AT&T BEST2展示一种高性能BiCMOS技术,旨在支持低功耗多GHz混合信号应用。报告的处理模块包括新颖的器件结构制造,As掩埋层的选择性外延封盖以及深度完全凹进的LOCOS隔离。对于npn双极型(A / sub e / = 1 / spl times / 2 um / sup 2 /)或在V处为23 GHz和24 GHz的情况下,采用宽松的设计规则开发的工艺已达到f / sub t /和f / sub max / / sub ce / = 3V。 BV / sub ceo // splges / 5.5伏,/ spl beta / V / sub A /产品为2400。典型/最小ECL门延迟的测量值为48 ps / 37 ps(A / sub e / = 1 / spl次/ 2 um / sup 2 /:500 mV摆幅)在0.6 mA / 2.1 mA的阶段电流下,以及CMOS栅极延迟(栅极氧化物= 125 A / spl deg /,L / sub eff / = 0.6 um; V / sub th ,nch / = 0.45 V; V / sub th,pch / =-0.45 V)70 ps /级。 BiCMOS锁相环(发射极宽度= 1 um;门L / sub eff / = 0.7 um)在2 V电源和60 mW的总功耗下达到了6 GHz的世界纪录。

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